Two-stage reflective optical system for achromatic 10 nm x-ray focusing
Two-stage reflective optical system for achromatic 10 nm x-ray focusing
复制标题
用于消色差 10 nm X 射线聚焦的两级反射光学系统
DOI:
10.1088/0953-4075/48/24/244002
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发表时间:
2015
期刊:
影响因子:
--
通讯作者:
H. Motoyama and H. Mimura
中科院分区:
文献类型:
--
作者:
Konishi;M.;Motohara;K.;Takahashi;H.;Kato;N.;Terao;Y.;Ohashi;H.;Kono;Y.;Kushibiki;K.;Kodama;T.;Hayashi;M.;Tanaka;I.;Tadaki;K.-. ichi .;Toshikawa;J.;Koyama;Y.;Shimakawa;R.;Suzuki;T.;Tateuchi;K.;Kitagawa;Y.;Kobayakawa;Y.,;H. Motoyama and H. Mimura
Recently, coherent x-ray sources have promoted developments of optical systems for focusing, imaging, and interferometers. In this paper, we propose a two-stage focusing optical system with the goal of achromatically focusing pulses from an x-ray free-electron laser (XFEL), with a focal width of 10 nm. In this optical system, the x-ray beam is expanded by a grazing-incidence aspheric mirror, and it is focused by a mirror that is shaped as a solid of revolution. We describe the design procedure and discuss the theoretical focusing performance. In theory, soft-XFEL lights can be focused to a 10 nm area without chromatic aberration and with high reflectivity; this creates an unprecedented power density of 10 20 W cm− 2 in the soft-x-ray range.