Photoanodic properties of pulsed-laser-deposited α-Fe2O3 electrode
Photoanodic properties of pulsed-laser-deposited α-Fe2O3 electrode
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DOI：
10.1088/0022-3727/43/32/325101
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发表时间：
2010-08
期刊：
影响因子：
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通讯作者：
Junyu Cao;T. Kako;N. Kikugawa;Jinhua Ye
中科院分区：
文献类型：
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作者：
Junyu Cao;T. Kako;N. Kikugawa;Jinhua Ye
以赤铁矿颗粒为靶材，采用脉冲激光沉积法制备了氧化铁光电极。详细研究了光电流密度对退火后氧气压力、厚度、加热温度和表面形貌的依赖性。使用拉曼光谱、XPS、紫外可见吸收光谱、SEM、电流密度和光电化学测量来表征光电极性能。采用SiO2球模板法制备的70 nm厚的α-Fe2O3薄膜，在160 Pa O2压力、550 ℃下进行后退火，在AM1.5太阳模拟光照射下表现出最高的光电流密度（275 µA cm−2）。
Iron oxide photoelectrodes were prepared using pulsed laser deposition with hematite pellet as the target. The dependences of photocurrent density on post-annealing O2 pressure, thickness, heating temperature and surface morphology were investigated in detail. The photoelectrode properties were characterized using Raman spectroscopy, XPS, UV–vis absorption spectroscopy, SEM, current density and photoelectrochemical measurements. The α-Fe2O3 thin film of thickness 70 nm prepared using the SiO2 sphere template method with post-annealing under an O2 pressure of 160 Pa at 550 °C showed the highest photocurrent density (275 µA cm−2) under AM1.5 solar simulated light irradiation.