Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS
Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS
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DOI：
10.1016/j.eurpolymj.2013.08.011
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发表时间：
2013-11-01
影响因子：
6
通讯作者：
Morris, Michael A.
中科院分区：
文献类型：
--
作者：
Borah, Dipu;Simao, Claudia D.;Morris, Michael A.
我们在这里报告的周期性的子25纳米直径大小的圆柱体结构的制造使用嵌段共聚物（BCP）定向自组装纳米压印地形图案化基板上。定制的多面体低聚倍半硅氧烷（POSSs）薄膜旋涂到硅衬底上，并通过纳米压印光刻图案化，以产生与BCP域间距可匹配的形貌。POSS的化学性质被调节以控制BCP膜的取向和定向。使用所述基底来引导形成聚苯乙烯-嵌段-聚二甲基硅氧烷（PS-b-PDMS）的六方结构的微相分离（在甲苯溶剂退火之后），所述聚苯乙烯-嵌段-聚二甲基硅氧烷（PS-b-PDMS）具有42.6nm的域间距和23.7nm的PDMS圆柱体宽度。在更亲水的FOSS基板上，获得平行于基板平面并与形貌对齐的圆柱体。相比之下，在更疏水的POSS图案中，圆柱体垂直于基底平面对齐。使用这些方法的纳米加工的通孔，纳米流体器件或互连结构的子-25 nm的特征尺寸进行了讨论。(C)2013爱思唯尔有限公司保留所有权利。
We report here the fabrication of periodic sub-25 nm diameter size cylinder structures using block copolymer (BCP) directed self-assembly on nanoimprinted topographically patterned substrates. Tailored polyhedral oligomeric silsesquioxanes (POSSs) films were spin coated onto silicon substrates and were patterned by nanoimprint lithography to produce topographies commensurable with the BCP domain spacing. The chemistry of the POSS was tuned to control the alignment and orientation of the BCP films. The substrates were used to direct the microphase separation (following toluene solvent annealing) of a hexagonal structure forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS) having a domain spacing of 42.6 nm and PDMS cylinder widths of 23.7 nm. On more hydrophilic FOSS substrates the cylinders were obtained parallel to the substrate plane and aligned with the topography. In contrast, in more hydrophobic POSS patterns, the cylinders align perpendicular to the substrate plane. The use of these methods for the nanofabrication of vias, nanofluidic devices or interconnect structures of sub-25 nm feature size is discussed. (C) 2013 Elsevier Ltd. All rights reserved.