High-resolution strain measurement in shallow trench isolation structures using dynamic electron diffraction
High-resolution strain measurement in shallow trench isolation structures using dynamic electron diffraction
复制标题
使用动态电子衍射在浅沟槽隔离结构中进行高分辨率应变测量
DOI：
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发表时间：
2004
期刊：
影响因子：
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通讯作者：
G. Park
中科院分区：
文献类型：
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作者：
Miyoung Kim;J. Zuo;G. Park
我们报告了一种多功能的电子衍射应变测量技术及其在浅沟槽隔离（STI）器件结构中的应变测量中的应用。利用场发射透射电子显微镜中会聚束电子形成的纳米尺寸探针，以高空间分辨率记录电子衍射图案。通过拟合的衍射图案与图案匹配技术，使用动态理论，它表明，在设备中的应变可以测量具有高精度的量化STI结构中的不同填充材料的影响。
We report a versatile electron diffraction strain measurement technique and its application to strain in shallow trench isolation (STI) device structures. Using a nanometer-sized probe formed by convergent-beam electrons in a field-emission transmission electron microscope, electron diffraction patterns were recorded with high spatial resolution. By fitting the diffraction patterns with a pattern matching technique using dynamic theory, it is shown that strain in the device can be measured with high accuracy to quantify the effects of different filling materials in STI structures.