Corrosion of silicon nitride ceramics in aqueous HF solutions
Corrosion of silicon nitride ceramics in aqueous HF solutions
复制标题
氮化硅陶瓷在HF水溶液中的腐蚀
DOI：
10.1007/bf00540476
复制
发表时间：
1988
影响因子：
4.5
通讯作者：
T. Kameda
中科院分区：
文献类型：
--
作者：
T. Sato;Y. Tokunaga;T. Endo;M. Shimada;K. Komeya;K. Nishida;M. Komatsu;T. Kameda
研究了添加了Y_2O_3、Al_2O_3和AIN的热压Si3N_4陶瓷和不添加添加剂的热等静压Si3N_4陶瓷在50~80℃的0.1~10M HF水溶液中的浸出行为。硅和铝离子溶解在HF溶液中，而Y离子则完全不溶解，形成不溶的YF3。硅、铝离子的溶解受表面化学反应控制，表观活化能分别为70.5~87.6kJ·−~(-1)。腐蚀速率随晶界相结晶程度的增加而增加。腐蚀导致表面粗糙，断裂强度下降。晶界含有非晶相的Si3N4陶瓷具有最好的抗HF溶液腐蚀性能，即使在浸出40%的硅离子后仍能保持400 Mpa以上的断裂强度。
The leaching behaviours of hot-pressed Si3N4ceramics containing Y2O3, Al2O3and AIN as additives and hot isostatically pressed Si3N4without additives were studied in 0.1 to 10 M HF aqueous solutions at 50 to 80° C. Silicon and aluminium ions were dissolved into the HF solutions, but yttrium ion did not dissolve at all and formed insoluble YF3. The dissolution of silicon and aluminium ions was controlled by the surface chemical reaction and the apparent activation energies were 70.5 to 87.6 kJ mol−1, respectively. The corrosion rate increased with increasing degree of crystallization of the grain boundary phases. The corrosion resulted in roughness of the surface and degradation of the fracture strength. Si3N4ceramics containing an amorphous phase at the grain boundaries showed the most excellent resistance to corrosion with HF solution, and kept a fracture strength of above 400 M Pa even after leaching 40% of the silicon ions.