Ni/Si(111) system: Formation and evolution of two- and three-dimensional phases studied by spectromicroscopy
Ni/Si(111) system: Formation and evolution of two- and three-dimensional phases studied by spectromicroscopy
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Ni/Si(111) 系统：通过光谱显微镜研究二维和三维相的形成和演化
DOI：
10.1103/physrevb.59.2018
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发表时间：
1999
期刊：
影响因子：
--
通讯作者：
M. Kiskinova
中科院分区：
文献类型：
--
作者：
L. Gregoratti;S. Günther;J. Kovac;M. Marsi;R. Phaneuf;M. Kiskinova
用同步辐射扫描光电子显微镜研究了在830K下反应外延形成的Ni/Si界面的成分和电子结构的空间变化，并用同步辐射扫描光电子显微镜研究了连续退火到950K的界面的成分和电子结构的空间变化。亚微米空间分辨率(⩽0.15μm)和高能量分辨率的结合使我们能够表征共存的相，包括微米级的硅化物岛和二维结构。当沉积温度为830K时，0.7ML Ni形成了具有不同Ni含量的19相磁畴，并与NiSi和NiSi2岛共存。将该界面退火至950K后，19晶面转变为(1×1)-RC结构(其中Rc为环团簇)，其表面似乎比19晶面更均匀。从化学图谱和与共存相对应的Si2p、Ni3p和价带谱确定了相的性质，并研究了Ni在19和(1×1)-RC表面上的质量输运机制。
The spatial variations in the composition and electronic structure of Ni/Si interfaces formed via reactive epitaxy at 830 K and successively annealed to 950 K have been studied by synchrotron-radiation scanning photoelectron microscopy, a method that combines chemical mapping with photoelectron spectroscopy from selected spots of the surface. The combination of submicron spatial resolution (⩽ 0.15 μm) with high energy resolution allowed us to characterize the coexisting phases including micron-sized silicide islands and two-dimensional structures. Deposition of 0.7 ML Ni at 830 K produced domains of the 19 phase with different Ni concentration, coexisting with NiSi and NiSi 2 islands. Annealing this interface to 950 K led to conversion of the 19 to a (1× 1)-RC structure (where RC is ring cluster), which appears to be more uniform than the 19 surface. From the chemical maps and the Si 2p, Ni 3p, and valence-band spectra corresponding to the coexisting phases the nature of the phases was determined and the mechanism of the Ni mass transport on the 19 and (1× 1)-RC surfaces was examined.