Interfacial adhesion of alumina thin films over the full compositional range of ternary fcc alloy films: A combinatorial nanoindentation study

Interfacial adhesion of alumina thin films over the full compositional range of ternary fcc alloy films: A combinatorial nanoindentation study
复制标题

氧化铝薄膜在三元面心立方合金薄膜的整个成分范围内的界面粘附:组合纳米压痕研究

DOI:
10.1016/j.matdes.2020.108802
复制
发表时间:
2020
期刊:
影响因子:
8.4
通讯作者:
J. Michler
J. Michler
中科院分区:
材料科学1区
文献类型:
--
作者:
R. Schoeppner;Calum G. Ferguson;L. Pethö;Carlos Guerra;A. Taylor;M. Polyakov;B. Putz;J. Breguet;I. Utke;J. Michler

文献摘要

参考文献

被引文献

相似文献

薄膜的组合材料设计允许人们研究基本的力学关系和优化薄膜的工程应用。使用专门为精确控制涂层设计而开发的新集成快门控制器,可以将具有完整成分范围的三元合金沉积到单个晶圆上。可编程快门允许人们创建两种或三种不同材料的多层厚度梯度,然后可以对其进行退火以创建具有大成分梯度的薄膜。在(0001)蓝宝石晶片上磁控溅射两种50 nm面心立方合金(AlCuAu、AuAgPd)。整个晶片的化学组成的变化进行了研究与能量色散X射线光谱和透射电子显微镜。AlCuAu在整个晶片上显示出多个相和金属间化合物,而对于AuAgPd,观察到固溶体。这两种合金都涂覆有400 nm的Al2O3(原子层沉积,ALD),以研究它们作为ALD涂层的粘附层的潜力。用仪器化纳米压痕法测量双层在晶片上的粘附力,产生明确的分层气泡。放置在表面上的小阵列的凹痕,每个位置对应于不同的粘附层组合物,说明了单个样品中的许多界面组合物的粘附促进特性。对于两个双层系统,粘附映射揭示了最佳粘附性能的最佳粘附层组合物的区域。
Combinatorial materials design of thin films allows one to investigate fundamental mechanic relationships and optimize films for engineering applications. Using a newly integrated shutter controller, specifically developed for precise control over coating design, ternary alloys with full compositional range can be deposited onto single wafers. Programmable shutters allow one to create multilayered thickness gradients of two or three different materials, which can then be annealed to create films with large compositional gradients. Two 50 nm fcc alloys (AlCuAu, AuAgPd) were magnetron sputtered onto (0001) sapphire wafers. The changing chemical composition across the wafer was investigated with energy dispersive x-ray spectroscopy and transmission electron microscopy. AlCuAu showed multiple phases and intermetallics across the wafer, whereas for AuAgPd a solid-solution was observed. Both alloys were coated with 400 nm Al2O3(atomic layer deposition, ALD), to investigate their potential as adhesion layers for ALD coatings. Adhesion of the bilayers across the wafer was measured with instrumented nanoindentation, producing well-defined delamination-blisters. Small arrays of indents placed over the surface, each location corresponding to different adhesion layer compositions, illustrate adhesion-promoting properties of numerous interface compositions in single samples. For the two bilayer systems, adhesion mapping revealed the areas of optimum adhesion layer composition for best adhesion properties.
DOI: 10.1016/j.matdes.2019.108327
发表时间: 2020-01-15
期刊: MATERIALS & DESIGN
影响因子: 8.4
作者:
Evertz, Simon;Kirchlechner, Ines;Schneider, Jochen M.
通讯作者: Schneider, Jochen M.