Electroless deposition of platinum on titanium substrates
Electroless deposition of platinum on titanium substrates
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DOI：
10.1016/s0254-0584(00)00268-6
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发表时间：
2001-02
影响因子：
4.6
通讯作者：
C. R. Rao;M. Pushpavanam
中科院分区：
文献类型：
--
作者：
C. R. Rao;M. Pushpavanam
使用基于氯铂酸和肼的化学镀铂浴在钛板上沉积粘附和均匀的层。这些条件针对一组新的添加剂进行了优化。研究了镀液中铂金属浓度对存款厚度的影响。对钛和镀金钛上的沉积速率进行了评价。成功地在钛粉表面制备了分散的铂涂层。
The use of an electroless platinum bath based on chloroplatinic acid and hydrazine for depositing adherent and uniform layers on titanium panels is demonstrated. The conditions were optimised for a new set of additives. The effect of concentrations of platinum metal in the bath on thickness of the deposit was studied. The deposition rates on titanium and gold-plated titanium are evaluated. Dispersed platinum coatings on titanium powder were successfully obtained.