Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source
Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source
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DOI：
10.1007/s00339-011-6540-8
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发表时间：
2011-10-01
影响因子：
2.7
通讯作者：
Mann, Klaus
中科院分区：
文献类型：
--
作者：
Barkusky, Frank;Bayer, Armin;Mann, Klaus
我们已经研究了烧蚀的聚合物与辐射的13.5 nm波长，使用台式激光产生的等离子体源的基础上固体金作为目标材料。采用带有Mo/Si多层涂层的Schwarzschild物镜作为光源，产生直径为5 μ m的EUV光斑，最大能量密度接近1.3 J/cm（2）。结合锆透射滤光片，可以在照射点上提供高光谱纯度（2%带宽）的辐射。对PMMA、PTFE和PC进行了消融实验。使用原子力显微镜和白色光干涉测量法确定不同注量的消融速率。这些曲线的斜率相对于聚合物的化学结构进行了讨论。此外，烧蚀行为方面的有效穿透深度，阈值注量和孵化效果进行了比较，文献数据为更高的紫外波长。
We have investigated ablation of polymers with radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. A Schwarzschild objective with Mo/Si multilayer coatings was adapted to the source, generating an EUV spot of 5 mu m diameter with a maximum energy density of similar to 1.3 J/cm(2). In combination with a Zirconium transmission filter, radiation of high spectral purity (2% bandwidth) can be provided on the irradiated spot. Ablation experiments were performed on PMMA, PTFE and PC. Ablation rates were determined for varying fluences using atomic force microscopy and white light interferometry. The slopes of these curves are discussed with respect to the chemical structure of the polymers. Additionally, the ablation behavior in terms of effective penetration depths, threshold fluences and incubation effects is compared to literature data for higher UV wavelength.