Maskless nanofabrication using the electrostatic attachment of gold particles to electrically patterned surfaces
Maskless nanofabrication using the electrostatic attachment of gold particles to electrically patterned surfaces
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DOI：
10.1016/s0167-9317(02)00441-0
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发表时间：
2002-07-01
影响因子：
2.3
通讯作者：
Stemmer, A
中科院分区：
文献类型：
--
作者：
Mesquida, P;Stemmer, A
我们提出了一种在非水悬浮液中沉积20纳米金胶体纳米颗粒到电图案表面的无掩膜金属结构制造方法。图案是通过使用导电原子力显微镜（AFM）尖端向绝缘的薄氟碳薄膜局部注入电荷来实现的，并向其施加电压脉冲。这些被捕获的电荷在驻极体表面上方产生电场，吸引带相反电荷的粒子。开尔文探针力显微镜（KFM）测得侧向电荷模式分辨率约为100 nm，沉积金颗粒形成的谱线宽度约为500 nm。(C) 2002 Elsevier Science B.V.版权所有
We present a method for maskless fabrication of metal structures in the nanometre range by depositing 20-nm-gold-colloid nanoparticles from a non-aqueous suspension onto electrically patterned surfaces. Patterning is performed by locally injecting electric charges into an insulating, thin fluorocarbon film using a conductive atomic force microscope (AFM) tip to which voltage pulses are applied. These trapped charges generate an electric field above the electret surface attracting oppositely charged particles. The lateral charge pattern resolution is about 100 nm as determined by Kelvin probe force microscopy (KFM) and the width of lines formed by deposited gold particles is about 500 nm. (C) 2002 Elsevier Science B.V. All rights reserved.