A convenient approach to 10−12g/g ICP-MS limits for Th and U in aurubis electrolytic NA-ESN brand copper
A convenient approach to 10−12g/g ICP-MS limits for Th and U in aurubis electrolytic NA-ESN brand copper
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一种将 aurubis 电解 NA-ESN 品牌铜中 Th 和 U 限制在 10−12g/g ICP-MS 的便捷方法
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发表时间：
2014
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通讯作者：
D. Leonard
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文献类型：
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作者：
D. Leonard
电感耦合等离子体质谱是一种强大的技术，用于测量材料中痕量放射性污染物，特别是Th和U，用于建造低背景稀有事件探测器，如双β衰变和暗物质探测器。我在这里描述了一种测量铜中Th和U污染的技术，该技术通过使用直接酸消化和稀释而无需进一步的化学处理，获得的结果与以前的工作[1，2]中获得的结果相当，该工作利用更复杂的化学预浓缩技术。一个方便的面向研究的分析环境，以及描述。本文给出了三个样品的测量结果，这三个样品来自电解纯化的LME（伦敦金属交易所）A级NA-ESN Aurubis铜的生产线。纯化的样品显示出与两种元素的零污染一致的水平，而未纯化的阳极铜存在微弱但不确定的污染迹象。对于从净化过程的阴极测量的铜的Th和U，达到的最佳限度接近1 μ 10− 12 g/g（95% CL）。
Inductively-coupled-plasma mass spectroscopy is a powerful technique for measuring trace levels of radioactive contaminants, specifically Th and U, in materials for use in construction of low-background rare-event detectors such as double beta decay and dark matter detectors. I describe here a technique for measuring Th and U contamination in copper by using direct acid digestion and dilution without further chemical processing, achieving results comparable to those achieved in previous work [1, 2] which utilized more complex chemical pre-concentration techniques. A convenient research-oriented analysis environment is described as well. Results are presented for measurements of three samples from the production line of electrolytically-purified, LME (London Metal Exchange) grade A, NA-ESN Aurubis copper. Purified samples showed levels consistent with zero contamination for both elements, while weak, but inconclusive, indications of contamination were present for the unpurified anode copper. The best limits achieved are near 1∙10−12g/g (95% CL) for both Th and U measured for copper from the cathode of the purification process.