Rapid Focused Ion Beam Milling Based Fabrication of Plasmonic Nanoparticles and Assemblies via "Sketch and Peel" Strategy
Rapid Focused Ion Beam Milling Based Fabrication of Plasmonic Nanoparticles and Assemblies via "Sketch and Peel" Strategy
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DOI：
10.1021/acsnano.6b06290
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发表时间：
2016-12-01
期刊：
影响因子：
17.1
通讯作者：
Duan, Huigao
中科院分区：
文献类型：
--
作者：
Chen, Yiqin;Bi, Kaixi;Duan, Huigao
聚焦离子束（FIB）铣削是一种通用的无掩模和无抗蚀剂图案化技术，并且已经广泛用于制造用于各种应用的诸如纳米孔和纳米缝的逆等离子体结构。然而，由于其减磨性质，它是一种不切实际的方法来制造应用中更常用的孤立等离子体纳米颗粒和组装体。在这项工作中，我们提出并证明了一种方法，通过一个简单的“草图和剥离”的策略，使用FIB铣削可靠，快速地定义等离子体纳米粒子及其组件。系统的实验研究和机理研究表明，这种制造方法的高可靠性是由共形形成的侧壁涂层，由于离子铣削诱导的再沉积。特别地，我们证明了这种策略也适用于最先进的氦离子束铣削技术，利用该技术可以直接快速地原型化具有微小间隙的高保真等离子体二聚体。由于所提出的方法能够快速可靠地图案化通过常规FIB铣削工艺制造不可行的任意等离子体纳米结构，因此我们的工作为FIB铣削技术提供了额外的纳米图案化能力，从而可以大大提高其在基础研究和器件原型设计中的应用。
Focused ion beam (FIB) milling is a versatile maskless and resistless patterning technique and has been widely used for the fabrication of inverse plasmonic structures such as nanoholes and nanoslits for various applications. However, due to its subtractive milling nature, it is an impractical method to fabricate isolated plasmonic nanoparticles and assemblies which are more commonly adopted in applications. In this work, we propose and demonstrate an approach to reliably and rapidly define plasmonic nanoparticles and their assemblies using FIB milling via a simple "sketch and peel" strategy. Systematic experimental investigations and mechanism studies reveal that the high reliability of this fabrication approach is enabled by a conformally formed sidewall coating due to the ion-milling-induced redeposition. Particularly, we demonstrated that this strategy is also applicable to the state-of-the-art helium ion beam milling technology, with which high-fidelity plasmonic dimers with tiny gaps could be directly and rapidly prototyped. Because the proposed approach enables rapid and reliable patterning of arbitrary plasmonic nanostructures that are not feasible to fabricate via conventional FIB milling process, our work provides the FIB milling technology an additional nanopatterning capability and thus could greatly increase its popularity for utilization in fundamental research and device prototyping.