Appearance mass spectrometry of neutral radicals in radio frequency plasmas
Appearance mass spectrometry of neutral radicals in radio frequency plasmas
复制标题
射频等离子体中中性自由基的外观质谱分析
DOI：
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发表时间：
1992
期刊：
影响因子：
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通讯作者：
H. Toyoda
中科院分区：
文献类型：
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作者：
H. Sugai;H. Toyoda
高灵敏度的空间分辨测量中性自由基的数密度在反应等离子体已经完成了外观质谱。该技术基于电子碰撞电离的出现电势之间的几个电子伏特差。首先，考虑了表观质谱的一些困难，特别是受激发的母体分子和自由基粘附的影响。其次，在0.01-0.3乇的压力下，测量了甲烷平行板射频放电中中性自由基CH_3和CH_2的空间分布。结果通过一维数值模拟得到了很好的描述，其输入参数由电子能量分布、离子组成和自由基粘附系数的综合测量提供。第三，在0.01- 0.2Torr的CF 4压力下测量了氟碳蚀刻等离子体中CF 3和CF2自由基的密度分布。最后，几个应用…
High‐sensitivity space‐resolved measurements of the number density of neutral free radicals in reactive plasmas have been accomplished by appearance mass spectrometry. This technique is based on several electron volts difference among the appearance potentials for electron‐impact ionization. First, some difficulties accompanied with the appearance mass spectrometry are considered, especially on the influence of excited parent molecules and radical sticking. Second, spatial distributions of neutral radical CH3 and CH2 in a parallel plate rf discharge of methane at a pressure of 0.01–0.3 Torr have been measured. The results are well described by a one‐dimensional numerical modeling whose input parameters are provided by comprehensive measurements of electron energy distribution, ionic composition, and radical sticking coefficients. Third, the density distributions of CF3 and CF2 radicals in a fluorocarbon etching plasma at a CF4 pressure of 0.01–0.2 Torr have been measured. Finally, several applications of ...