Mechanical Motion of Azobenzene Crystals upon Photoirradiation
Mechanical Motion of Azobenzene Crystals upon Photoirradiation
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DOI：
10.1021/ja8098596
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发表时间：
2009-05-27
影响因子：
15
通讯作者：
Uchimoto, Hidetaka
中科院分区：
文献类型：
--
作者：
Koshima, Hideko;Ojima, Naoko;Uchimoto, Hidetaka
观察到反式-4-(二甲氨基)偶氮苯微晶的光机械弯曲。在紫外线照射下，板状微晶的（001）面迅速向与光源相反的方向弯曲，0.5秒后达到最大偏转。停止照射后 30 秒，微晶恢复到其初始平坦形状。这种机械运动在紫外线照射的重复循环中是可逆的。弯曲效应归因于紫外线诱导的反式-顺式光异构化程度随光穿透的函数的梯度，导致受照射的晶体表面沿b轴膨胀，从而产生弯曲的宏观结构。
Photomechanical bending of trans-4-(dimethylamino)azobenzene microcrystals was observed. Upon UV irradiation, the (001) face of the platelike microcrystals bent quickly in the direction opposite the light source, reaching the maximum deflection after 0.5 s. The microcrystal returned to its initial flat shape 30 s after the illumination was stopped. This mechanical motion was reversible over repeated cycles of UV irradiation. The bending effect was attributed to a gradient in the extent of UV-induced trans-cis photoisomerization as a function of light penetration, causing the expansion of the irradiated crystal surface along the b axis to result in a bent macrostructure.