Vanadium Oxide Thin Film by Aqueous Spray Deposition
Vanadium Oxide Thin Film by Aqueous Spray Deposition
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水喷雾沉积法制备氧化钒薄膜
DOI：
10.1557/adv.2018.512
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发表时间：
2018
期刊：
影响因子：
0.8
通讯作者：
R. Peale
中科院分区：
文献类型：
--
作者：
Seth Calhoun;R. N. Evans;C. Nickle;I. Oladeji;J. Cleary;Evan M. Smith;S. Chandra;D. Chanda;R. Peale
氧化钒由于具有高的电阻温度系数（TCR）而应用于红外测辐射热计。由于其在室温附近的金属到绝缘体的转变，它吸引了人们对可切换等离子体器件的兴趣。我们在这里报告的性质的钒氧化物沉积的水喷雾过程。薄膜表面粗糙度为≤ 70 nm，呈粘稠状.多晶相取决于退火条件。薄膜的TCR为1.2%/deg，这与溅射薄膜相比很好。只有微弱的证据被发现在这些薄膜中的绝缘体-金属相变。
Vanadium Oxide has application to infrared bolometers due to high temperature coefficient of resistivity (TCR). It has attracted interest for switchable plasmonic devices due to its metal to insulator transition near room temperature. We report here the properties of vanadium oxide deposited by an aqueous spray process. The films have a ropy surface morphology with ∼70 nm surface roughness. The polycrystalline phase depends on annealing conditions. The films have TCR of ∼2%/deg, which compares well with sputtered films. Only weak evidence is found for an insulator-metal phase transition in these films.