Mechanism of visible light phototoxicity on Porphyromonas gingivalis and Fusobacterium nucleatum
Mechanism of visible light phototoxicity on Porphyromonas gingivalis and Fusobacterium nucleatum
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DOI：
10.1562/2005-04-06-ra-477
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发表时间：
2005-09-01
影响因子：
3.3
通讯作者：
Weiss, EI
中科院分区：
文献类型：
--
作者：
Feuerstein, O;Ginsburg, I;Weiss, EI
以前的研究表明，在没有光敏剂的情况下，在有氧条件下，可见光激光对牙龈卟啉单胞菌具有光毒性。最近，我们发现牙科修复中常用的400-500 nm非相干可见光对牙周炎假单胞菌和核梭杆菌都有光毒作用，对链球菌也有一定程度的光毒作用。为了阐明这种光毒效应的机制，我们将牙龈假单胞菌和核假单胞菌暴露于光照(1)在好氧和厌氧环境下和(2)在活性氧自由基(ROS)清除剂存在的情况下。该菌在厌氧条件下暴露于光照条件下，未观察到光毒效应。羟基自由基清除剂二甲基硫脲对光毒性有明显的抑制作用(P
Phototoxicity of visible light laser on the porphyrin-producing bacteria, Porphyromonas gingivalis, in the absence of photosensitizers and under aerobic conditions was shown in previous studies. Recently, we found that the noncoherent visible light sources at wavelengths of 400-500 nm, commonly used in restorative dentistry, induced a phototoxic effect on P. gingivalis, as well as on Fusobacterium nucleatum, and to a lesser extent on the Streptococci sp. To elucidate the mechanism of this phototoxic effect, P. gingivalis and F. nucleatum were exposed to light (1) under aerobic and anaerobic environments and (2) in the presence of scavengers of reactive oxygen species (ROS). Phototoxic effect was not observed when the bacteria were exposed to light under anaerobic conditions. Dimethyl thiourea, a hydroxyl radical scavenger, was effective in reducing phototoxicity (P