LPCVD silicon-rich silicon nitride films for applications in micromechanics, studied with statistical experimental design
LPCVD silicon-rich silicon nitride films for applications in micromechanics, studied with statistical experimental design
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DOI：
10.1116/1.580239
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发表时间：
1996-09-01
影响因子：
2.9
通讯作者：
Visser, CCG
中科院分区：
文献类型：
--
作者：
Gardeniers, JGE;Tilmans, HAC;Visser, CCG
系统地研究了低压化学气相沉积SixNy薄膜的工艺参数温度、压力、总气体流量和SiH_2Cl_2：NH_3气体流量比对薄膜的残余应力、折射率及其不均匀性、薄膜生长速率、薄膜厚度不均匀性和Si/N掺入比的影响。作为一种工具，完整的表征的属性沉积参数的关系，一个完整的析因实验设计，用于确定主导工艺参数和它们的相互作用。从该研究可以得出结论，以重要性降序，含Si和N的前体的气体流量比、温度和压力是确定膜的机械和光学性质以及整个晶片上的膜性质的沉积速率和不均匀性的最相关的参数。建立的性能和沉积参数之间的关系进行了拟合与物理化学模型，包括膜生长模型的基础上的Freundlich吸附等温线。将讨论用于微机械器件的薄膜的最佳沉积条件。(C)1996年美国真空学会。
A systematic investigation of the influence of the process parameters temperature, pressure, total gas flow, and SiH2Cl2:NH3 gas flow ratio on the residual stress, the refractive index, and its nonuniformity across a wafer, the growth rate, the film thickness nonuniformity across a wafer, and the Si/N incorporation ratio of low pressure chemical vapor deposition SixNy films has been performed. As a tool for complete characterization of the property-deposition parameter relations, a full factorial experimental design was used to determine the dominant process parameters and their interactions. From this study it could be concluded that, in decreasing order of importance, the gas flow ratio of Si and N containing precursors, temperature, and pressure are the most relevant parameters determining the mechanical and optical properties of the films and the deposition rate and nonuniformity in film properties across a wafer. The established relations between properties and deposition parameters were fitted with physical-chemical models, including a film growth model based on a Freundlich adsorption isotherm. The optimal deposition conditions for films to be used in micromechanical devices will be discussed. (C) 1996 American Vacuum Society.