Direct nanoimprinting of metal nanoparticles for nanoscale electronics fabrication
Direct nanoimprinting of metal nanoparticles for nanoscale electronics fabrication
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DOI：
10.1021/nl070333v
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发表时间：
2007-07-01
期刊：
影响因子：
10.8
通讯作者：
Frechet, Jean M. J.
中科院分区：
文献类型：
--
作者：
Ko, Seung H.;Park, Inkyu;Frechet, Jean M. J.
研究了金属纳米颗粒的一步直接纳米压印技术，以制备纳米点、纳米线阵列等纳米/微米尺度的金属结构。这是在低温和低压下进行的，利用了金属纳米颗粒溶液的低熔融温度和粘度。通过精确控制纳米颗粒溶液的流体特性和模具设计，纳米压印出没有或可忽略不计的残留层的高质量纳米级特征。还展示了纳米级电子器件，包括纳米线电阻器和具有空气稳定半导体聚合物的纳米通道有机场效应晶体管。
One-step direct nanoimprinting of metal nanoparticles was investigated to fabricate nano-/microscale metallic structures such as nanodot and nanowire arrays. This was done at low temperatures and pressures, utilizing the low melting temperature and viscosity of metal nanoparticle solutions. Through precise control of the fluidic properties of the nanoparticle solution and the mold design, high-quality nanoscale features with no or negligible residual layer were nanoimprinted. Nanoscale electronic devices were also demonstrated, including nanowire resistors and nanochannel organic field effect transistors with an air-stable semiconducting polymer.