Chemical potential jump between the hole-doped and electron-doped sides ofambip

Chemical potential jump between the hole-doped and electron-doped sides ofambip
复制标题

Ambip 的空穴掺杂侧和电子掺杂侧之间的化学势跳跃

DOI:
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发表时间:
2010
期刊:
Phys. Rev. B
影响因子:
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通讯作者:
and Y. Ando
and Y. Ando
中科院分区:
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文献类型:
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作者:
M. Ikeda;M. Takizawa;T. Yoshida;A.Fujimori;K. Segawa;and Y. Ando

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