Quantized electron transfer through random multiple tunnel junctions in phosphorus-doped silicon nanowires
Quantized electron transfer through random multiple tunnel junctions in phosphorus-doped silicon nanowires
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DOI:
10.1103/physrevb.76.075332
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发表时间:
2007-08-01
影响因子:
3.7
通讯作者:
Tabe, Michiharu
中科院分区:
文献类型:
--
作者:
Moraru, Daniel;Ono, Yukinori;Tabe, Michiharu
We have demonstrated numerically and experimentally that quantized electron transfer can be achieved in single-gated random multiple tunnel junctions. Extensive Monte Carlo simulations based on Coulomb blockade orthodox theory show that nonhomogeneous distributions of capacitances energetically favor one-by-one electron shuttling between the electrodes during each cycle of a gate voltage. This numerical prediction is supported by our experimental results on Si nanowire field-effect transistors with the channel moderately doped with phosphorus. Ionized dopants within the device channel locally modulate the potential, creating a naturally random one-dimensional multiple-tunnel-junction array. Under ac-gate operation, small current plateaus or inflections aligned at +/- nef appear in the I-d-V-d characteristics, suggesting that quantized electron transfer is achievable in such naturally disordered systems.