Film deposition on the inner surface of tubes using atmospheric-pressure Ar–CH4, Ar–C2H2 and Ar–C2H2–H2 plasmas: interpretation of film properties from plasma-chemical kinetics
Film deposition on the inner surface of tubes using atmospheric-pressure Ar–CH4, Ar–C2H2 and Ar–C2H2–H2 plasmas: interpretation of film properties from plasma-chemical kinetics
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DOI：
10.1088/0022-3727/45/33/335202
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发表时间：
2012-08
期刊：
影响因子：
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通讯作者：
Ramasamy Pothiraja;M. Engelhardt;N. Bibinov;P. Awakowicz
中科院分区：
文献类型：
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作者：
Ramasamy Pothiraja;M. Engelhardt;N. Bibinov;P. Awakowicz
在Ar-C2H2-H2和Ar-CH4混合气体中，利用常压灯丝放电在玻璃管内表面沉积了硬质碳氢膜。在类似的条件下，在Ar-C2H2混合气体中以较高的沉积速率沉积了软膜。这些薄膜硬度和沉积速率的差异是基于等离子体中的碳和氢元素组成来解释的。在Ar-C2H2-H2等离子体中，沉积速率沿管轴方向变化。这可以通过控制衬底(管)温度来控制。氢原子对沉积薄膜的化学侵蚀可能是产生这种效应的原因。利用光学发射光谱(OES)、显微照相和数值模拟等手段对三种混合气体的等离子体条件(气体温度、电子分布函数和电子密度)进行了表征。通过在所有混合气体中应用OES来确定管内电极间区域的氢原子密度。根据所确定的等离子体参数，计算了前驱分子激发速率和后续等离子体化学反应速率。讨论了等离子体条件与薄膜性能之间的关系。
A hard hydrocarbon film is deposited on the inner surface of glass tubes using a filamentary discharge at atmospheric pressure in Ar–C2H2–H2 and Ar–CH4 mixtures. Under similar conditions, a soft film is deposited with a high deposition rate in an Ar–C2H2 mixture. These differences in film hardness and deposition rate are interpreted on the basis of carbon and hydrogen elemental composition in the plasma. The deposition rate is varied along the axis of the tubes in the Ar–C2H2–H2 plasma. This can be controlled by controlling the substrate (tube) temperature. Chemical erosion of the deposited film by hydrogen atoms is the probable reason for this effect. The plasma conditions (gas temperature, electron distribution function and electron density) are characterized by applying optical emission spectroscopy (OES), microphotography and numerical simulation for all three gas mixtures. The density of hydrogen atoms in the inter-electrode region of the tube is determined by applying OES in all gas mixtures. The rates of precursor molecule excitation and follow-up plasma-chemical reactions are calculated on the basis of the determined plasma parameters. Correlations between plasma conditions and film properties are discussed.