High quality electron beams from a laser wakefield accelerator

High quality electron beams from a laser wakefield accelerator
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来自激光尾场加速器的高质量电子束

DOI:
10.1088/0741-3335/52/12/124032
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发表时间:
2010
影响因子:
2.2
通讯作者:
D. Jaroszynski
D. Jaroszynski
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
S. Wiggins;R. Issac;G. Welsh;E. Brunetti;R. Shanks;M. Anania;S. Cipiccia;G. Manahan;C. Aniculaesei;B. Ersfeld;M. Islam;R. Burgess;G. Vieux;W. Gillespie;A. Macleod;S. van der Geer;M. de Loos;D. Jaroszynski

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在峰值功率为26 TW的飞秒激光脉冲驱动下,在激光等离子体加速器中产生了高质量的电子束。电子产生的能量高达150兆电子伏的2毫米气体射流加速器和测量的均方根相对能量扩展小于1%。在中心能量下的射击稳定性为3%。Pepper-pot测量表明,当束流电荷在2-10 pC范围内时,归一化的横向发射度为1.1 π mm mrad。高质量电子束的产生是从模拟中理解的韦克菲尔德加速结构的束负载。实验和自洽模拟表明,束流峰值电流为几千安。通过波荡器的光束的有效传输进行了模拟,并正在朝着实现紧凑的,高峰亮度的自由电子激光器在真空紫外和软X射线波长范围内操作的进展。
High quality electron beams have been produced in a laser-plasma accelerator driven by femtosecond laser pulses with a peak power of 26 TW. Electrons are produced with an energy up to 150 MeV from the 2 mm gas jet accelerator and the measured rms relative energy spread is less than 1%. Shot-to-shot stability in the central energy is 3%. Pepper-pot measurements have shown that the normalized transverse emittance is ∼1π mm mrad while the beam charge is in the range 2–10 pC. The generation of high quality electron beams is understood from simulations accounting for beam loading of the wakefield accelerating structure. Experiments and self-consistent simulations indicate that the beam peak current is several kiloamperes. Efficient transportation of the beam through an undulator is simulated and progress is being made towards the realization of a compact, high peak brilliance free-electron laser operating in the vacuum ultraviolet and soft x-ray wavelength ranges.
DOI: 10.1103/physrevlett.101.085002
发表时间: 2008-08-22
影响因子: 8.6
作者:
Osterhoff, J.;Popp, A.;Karsch, S.
通讯作者: Karsch, S.
DOI: 10.1038/nphys1404
发表时间: 2009-11-01
期刊: NATURE PHYSICS
影响因子: 19.6
作者:
Fuchs, Matthias;Weingartner, Raphael;Gruener, Florian
通讯作者: Gruener, Florian
DOI: 10.1038/nphys811
发表时间: 2008-02-01
期刊: NATURE PHYSICS
影响因子: 19.6
作者:
Schlenvoigt, H. -P.;Haupt, K.;Jaroszynski, D. A.
通讯作者: Jaroszynski, D. A.