Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates
Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates
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DOI：
10.1088/0957-4484/27/7/075302
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发表时间：
2016-02-09
期刊：
影响因子：
3.5
通讯作者：
Chaker, M.
中科院分区：
文献类型：
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作者：
Bossard, M.;Boussey, J.;Chaker, M.
在热纳米压印（NIL）的背景下，研究了由类金刚石（DLC）和非晶碳化硅（SiC）薄膜以及掺氟相关材料（F-DLC和F-SiC）制成的纳米压印模板的释放性能。对其耐久性和稳定性进行了评估，并与传统的硅或硅模具进行了比较，这些模具表面涂有防粘分子，作为自组装单层。首先调整等离子体增强化学气相沉积参数，以优化DLC和SiC薄膜的力学和结构性能。分析了氟掺杂量对沉积薄膜性能的影响。然后对DLC， F-DLC以及SiC和F-SiC模具进行了多次压印的比较分析，并进行了聚甲基丙烯酸甲酯（PMMA）热塑性电阻。通过对脱模能和表面能的测量，结合对模具表面污染的系统分析，对无图案薄膜的脱模性能进行了评价。这些分析表明，所开发的材料表现为本质上易于脱模和无污染的模具系列多达40个印记。据我们所知，这是第一次在对NIL材料的详尽比较研究中考虑如此大量的印迹。最后，开发的材料经过标准电子束光刻和等离子体蚀刻工艺，获得纳米级图案模板。这些模版的复制品，印入PMMA，被证明是高保真度和良好的稳定性后，几个印记。
Nanoimprint templates made of diamond-like carbon (DLC) and amorphous silicon carbide (SiC) thin films and fluorine-doped associated materials, i.e. F-DLC and F-SiC were investigated in the context of thermal nanoimprint lithography (NIL) with respect to their release properties. Their performances in terms of durability and stability were evaluated and compared to those of conventional silicon or silica molds coated with antisticking molecules applied as a self-assembled monolayer. Plasma-enhanced chemical vapor deposition parameters were firstly tuned to optimize mechanical and structural properties of the DLC and SiC thin films. The impact of the amount of fluorine dopant on the deposited thin films properties was then analyzed. A comparative analysis of DLC, F-DLC as well as SiC and F-SiC molds was then carried out over multiple imprints, performed into poly (methyl methacrylate) (PMMA) thermo-plastic resist. The release properties of un-patterned films were evaluated by the measurement of demolding energies and surface energies, associated with a systematic analysis of the mold surface contamination. These analyses showed that the developed materials behave as intrinsically easy-demolding and contamination-free molds over series of up to 40 imprints. To our knowledge, it is the first time that such a large number of imprints has been considered within an exhaustive comparative study of materials for NIL. Finally, the developed materials went through standard e-beam lithography and plasma etching processes to obtain nanoscale-patterned templates. The replicas of those patterned molds, imprinted into PMMA, were shown to be of high fidelity and good stability after several imprints.