Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
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DOI：
10.1063/1.125896
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发表时间：
2000-02-07
影响因子：
4
通讯作者：
Chou, SY
中科院分区：
文献类型：
--
作者：
Li, MT;Wang, JA;Chou, SY
我们演示了使用纳米压印光刻技术在聚甲基丙烯酸甲酯中制造最小特征尺寸为75纳米的菲涅耳带板和最小线宽为20纳米的圆形光栅，并通过提升技术在金属中制造。观察到清晰的云纹图案，表明纳米压印在图案复制方面具有较高的保真度。结果表明，纳米压印技术是一种很有前途的集成光学图像化技术。(C) 2000年美国物理研究所。[s0003 - 6951(00) 03906 - 1]。
We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moire patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprint lithography is a promising technology for patterning integrated optics. (C) 2000 American Institute of Physics. [S0003-6951(00)03906-1].