Fabrication and characterization of single-electron tunneling transistors in the superconducting state
Fabrication and characterization of single-electron tunneling transistors in the superconducting state
复制标题
超导态单电子隧道晶体管的制备和表征
DOI:
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发表时间:
1993
影响因子:
1.8
通讯作者:
M. Tinkham
中科院分区:
文献类型:
--
作者:
J. Hergenrother;M. Tuominen;T. Tighe;M. Tinkham
Electron-beam lithography was used to fabricate single electron charging effect devices with ultrasmall capacitance Al/Al/sub 2/O/sub 3//Al tunnel junctions. The single electron transistor is a three-terminal device composed of two series tunnel junctions and a gate electrode capacitively coupled to the island between them. Typical junctions are of area 60 nm*60 nm with a capacitance of 190 aF. The authors outline the fabrication procedures, discuss operational properties, and give sample handling considerations. These devices exhibit a highly nonlinear I-V characteristic which is modulated by the gate voltage, as expected for the Coulomb blockage. In the superconducting state, the superconducting gap in the quasiparticle density of states leads to transistor action above 1.3 K, a temperature easily reached with pumped liquid /sup 4/He refrigeration. The authors also discuss the observation of an intermittent intrinsic switching noise in the offset charge of the central island.<<ETX>>