Characterization of Low‐Temperature Microwave Plasma Treatment With and Without UV Light for Disinfection
Characterization of Low‐Temperature Microwave Plasma Treatment With and Without UV Light for Disinfection
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DOI：
10.1002/ppap.200900085
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发表时间：
2010-03
影响因子：
3.5
通讯作者：
T. Shimizu;T. Nosenko;G. Morfill;Takehiko Sato;Hans-Ulrich Schmidt;T. Urayama
中科院分区：
文献类型：
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作者：
T. Shimizu;T. Nosenko;G. Morfill;Takehiko Sato;Hans-Ulrich Schmidt;T. Urayama
研究了两种低温大气压Ar等离子体装置的化学特性和杀菌性能，其中一种装置在处理后的样品上有紫外线，另一种几乎没有紫外线。紫外线辐射的控制是通过两个喷嘴实现的。一个是笔直的形状，另一个是90°弯曲的形状。弯曲的喷嘴阻挡了火炬内部产生的光，同时允许等离子体气体到达样品。直喷嘴的使用允许等离子体气体和紫外线的处理。我们证明，即使是几乎没有紫外线的等离子体处理也具有杀菌特性。我们的测量表明，活性物种代表了我们低温等离子体的主要杀菌因素。
Chemical characteristics and bactericidal properties of two low‐temperature atmospheric‐pressure Ar plasma devices are investigated: one of them with UV and the other with almost no UV on treated samples. The control of the UV radiation is achieved by two nozzles. One has a straight shape, and the other has a 90°‐bent. The bent nozzle blocks the light produced inside the torch, whilst allowing the plasma gas to reach the samples. The use of the straight nozzle allows the treatment by both the plasma gas and UV. We demonstrate that even an almost UV‐free plasma treatment has bactericidal properties. Our measurements suggest that reactive species represent the main bactericidal factor of our low‐temperature plasma.