A simple low-temperature laser-doping employing phosphosilicate glass and borosilicate glass films for the source and drain formation in poly-Si thin film transistors
A simple low-temperature laser-doping employing phosphosilicate glass and borosilicate glass films for the source and drain formation in poly-Si thin film transistors
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一种简单的低温激光掺杂,采用磷硅酸盐玻璃和硼硅酸盐玻璃薄膜来形成多晶硅薄膜晶体管的源极和漏极
DOI:
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发表时间:
2001
期刊:
影响因子:
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通讯作者:
M. Han
中科院分区:
文献类型:
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作者:
Cheon‐Hong Kim;Sang;J. Jeon;M. Han