Characteristics of YBa2Cu3O7-x/SrTiO3/YBa2Cu3O7-x films formed by chemical solution deposition
Characteristics of YBa2Cu3O7-x/SrTiO3/YBa2Cu3O7-x films formed by chemical solution deposition
复制标题
化学溶液沉积YBa2Cu3O7-x/SrTiO3/YBa2Cu3O7-x薄膜的特性
DOI：
10.1016/j.ceramint.2014.05.018
复制
发表时间：
2014
影响因子：
5.2
通讯作者：
Qiao Fanyang
中科院分区：
文献类型：
--
作者：
Wu Chuanbao;Zhao Gaoyang;Qiao Fanyang
从实际应用的角度来看，与目前使用的各种真空沉积工艺相比，化学溶液沉积（CSD）技术在制备以YBa2Cu3O7−xfilms为超导层的超导体/绝缘体/超导体（SIS）结方面具有很大的前景。本研究采用CSD法制备了YBa2Cu3O7−x/SrTiO3/YBa2Cu3O7−x三层薄膜。结果表明，当SrTiO3的公称厚度为14 nm时，由于微桥和点接触的弱连接占主导地位，其结构的i - v曲线与弱链接约瑟夫森结相似。当层间标称厚度为40 nm时，由于隧道效应的主导作用，它们的i - v曲线表现出滞后性。当YBa2Cu3O7−xlayer的标称厚度为120 nm时，不存在超导耦合的各种薄弱环节，两层之间的电阻率为3.4×107Ω cm，可以满足超导电子器件中隔离电极的要求。
From the perspective of practical application, chemical solution deposition (CSD) technology is promising for the preparation of superconductor/insulator/superconductor (SIS) junctions with YBa2Cu3O7−xfilms as the superconducting layers compared with the various vacuum deposition processes currently used. In this study, trilayer films of YBa2Cu3O7−x/SrTiO3/YBa2Cu3O7−xwere prepared using the CSD method. It was observed that when the nominal thickness of the interlayer (SrTiO3) was 14 nm, theI–Vcurve of the structure was similar to that of a weak-link Josephson junction due to the predominant weak links of microbridges and point contacts. When the nominal thickness of the interlayer was 40 nm, theI–Vcurve exhibited hysteresis due to the predominant tunnel effect. When the nominal thickness of the interlayer was 120 nm, the various weak links for superconducting coupling were absent, and the resistivity between the two YBa2Cu3O7−xlayers was 3.4×107Ω cm, which can satisfy the requirements for isolating electrodes in superconducting electron devices.