Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma
Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma
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CF4/O2 等离子体中 CF 和 CF2 自由基的激光诱导荧光检测
DOI：
10.1063/1.98214
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发表时间：
1987
影响因子：
4
通讯作者：
N. D. Perry
中科院分区：
文献类型：
--
作者：
J. Booth;G. Hancock;N. D. Perry
激光诱导荧光已用于检测CF 4/O2等离子体蚀刻反应器中的基态CF和CF2自由基。测量报告的CF 2浓度的空间变化，CF自由基的旋转状态分布，和这两个物种与O2含量的等离子体的变化。
Laser induced fluorescence has been used to detect ground‐state CF and CF2 radicals in a CF4/O2 plasma etching reactor. Measurements are reported of the spatial variation of CF2 concentrations, of the CF radical rotational state distributions, and of the variation of both species with O2 content of the plasma.