Laser induced non-thermal deposition of ultrathin graphite
Laser induced non-thermal deposition of ultrathin graphite
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DOI：
10.1063/1.3703599
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发表时间：
2012-04
影响因子：
4
通讯作者：
M. Reininghaus;D. Wortmann;J. Finger;O. Faley;R. Poprawe;C. Stampfer
中科院分区：
文献类型：
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作者：
M. Reininghaus;D. Wortmann;J. Finger;O. Faley;R. Poprawe;C. Stampfer
提出了一种激光诱导烧蚀法制备石墨薄片的方法。通过改变的能量密度的烧蚀脉冲飞秒激光辐射，我们确定不同的值为“热”蒸发和所谓的“非热”烧蚀石墨片。非热烧蚀的存在是层状材料（例如石墨）中在法向和面内方向上的结合强度的强不对称性的直接结果。实验提取的非热烧蚀阈值为250 mJ/cm 2的石墨同意与理论预测。最后，我们沉积了尺寸为50 μm2的石墨薄片，我们用拉曼光谱和扫描力显微镜对其进行了表征。
We present a laser induced ablation process to fabricate ultrathin graphitic flakes. By varying the fluence of the ablating pulsed fs-laser radiation, we identify distinct values for "thermal" evaporation and so-called "non-thermal" ablation of graphitic flakes. The presence of the non-thermal ablation is a direct consequence of the strong asymmetry of the bonding strength in normal and in-plane direction in layered materials, such as graphite. The experimentally extracted non-thermal ablation threshold for graphite of 250 mJ/cm2 agrees well with theoretical predictions. Finally, we deposited ultrathin graphitic flakes of 50 μm2 in size, which we characterize by Raman spectroscopy and scanning force microscopy.