Anti-phase boundary accelerated exsolution of nanoparticles in non-stoichiometric perovskite thin films.
Anti-phase boundary accelerated exsolution of nanoparticles in non-stoichiometric perovskite thin films.
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DOI:
10.1038/s41467-022-34289-3
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发表时间:
2022-11-05
影响因子:
16.6
通讯作者:
Oh, Sang Ho
中科院分区:
文献类型:
--
作者:
Han, Hyeon;Xing, Yaolong;Park, Bumsu;Bazhanov, Dmitry, I;Jin, Yeongrok;Irvine, John T. S.;Lee, Jaekwang;Oh, Sang Ho
Exsolution of excess transition metal cations from a non-stoichiometric perovskite oxide has sparked interest as a facile route for the formation of stable nanoparticles on the oxide surface. However, the atomic-scale mechanism of this nanoparticle formation remains largely unknown. The present in situ scanning transmission electron microscopy combined with density functional theory calculation revealed that the anti-phase boundaries (APBs) characterized by the a/2 < 011> type lattice displacement accommodate the excess B-site cation (Ni) through the edge-sharing of BO6 octahedra in a non-stoichiometric ABO3 perovskite oxide (La0.2Sr0.7Ni0.1Ti0.9O3-δ) and provide the fast diffusion pathways for nanoparticle formation by exsolution. Moreover, the APBs further promote the outward diffusion of the excess Ni toward the surface as the segregation energy of Ni is lower at the APB/surface intersection. The formation of nanoparticles occurs through the two-step crystallization mechanism, i.e., the nucleation of an amorphous phase followed by crystallization, and via reactive wetting on the oxide support, which facilitates the formation of a stable triple junction and coherent interface, leading to the distinct socketing of nanoparticles to the oxide support. The atomic-scale mechanism unveiled in this study can provide insights into the design of highly stable nanostructures. Exsolution of transition metal cations from non-stoichiometric perovskites offer a route for the formation of stable nanoparticles on the surface. Here authors present an anti-phase boundaries-accelerated exsolution and two-step crystallisation of nanoparticles in non-stoichiometric perovskite thin films.
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影响因子:
3.7
作者:
Kresse, G;Furthmuller, J
通讯作者:
Furthmuller, J
影响因子:
3.7
作者:
MONKHORST, HJ;PACK, JD
通讯作者:
PACK, JD
影响因子:
16.6
作者:
Neagu D;Papaioannou EI;Ramli WKW;Miller DN;Murdoch BJ;Ménard H;Umar A;Barlow AJ;Cumpson PJ;Irvine JTS;Metcalfe IS
通讯作者:
Metcalfe IS
DOI:
10.1111/j.1151-2916.1993.tb03964.x
发表时间:
1993-10-01
影响因子:
3.9
作者:
IKEDA, JAS;CHIANG, YM
通讯作者:
CHIANG, YM
影响因子:
19
作者:
Heisig, Thomas;Kler, Joe;Dittmann, Regina
通讯作者:
Dittmann, Regina