The effect of pulsating potential on the morphology of metal deposits obtained by mass-transport controlled electrodeposition
The effect of pulsating potential on the morphology of metal deposits obtained by mass-transport controlled electrodeposition
复制标题
脉动电位对传质控制电沉积金属沉积物形貌的影响
DOI：
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发表时间：
1971
期刊：
影响因子：
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通讯作者：
K. Popov
中科院分区：
文献类型：
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作者：
A. Despić;K. Popov
通过在电极上施加不同频率的脉冲阴极过电位，对铜和锌的沉积进行了实验。在电位区，产生的电流足够大，足以在电极上产生完全的浓差极化，结果表明，在很低的频率(t~10cps)下，沉积的表面粗糙度随着时间的增加而增加，其方式与直流类似。证词。随着频率的增加，获得的镀层越来越光滑，在高频(≈，000 cps)下，表面粗糙度没有增加。对于可逆电极，已发展出一种理论，将这种效应归因于脉冲电势的容量，以产生主要由频率决定的恒定厚度的有效扩散层。在很高的频率下，扩散层很薄，并且紧密地跟随表面的微观轮廓，以至于扩散通量和所产生的沉积是均匀的，不会放大表面的不规则性。
Experiments have been carried out on the deposition of copper and zinc by imposing pulsating cathodic overpotentials of varying frequency on the electrodes. In the potential region, where the resulting currents were large enough to produce complete concentration polarization at the electrode, it was shown that at very low frequency (t~10 cps) deposits exhibited surface roughness increasing with time in a manner similar to that seen in d.c. deposition. With increasing frequency an ever smoother deposit was obtained, and at high frequencies (≈ 10,000 cps) no increase in surface roughness could be noted. A theory has been developed for reversible electrodes ascribing this effect to the capacity of the pulsating potential to give an effective diffusion layer of constant thickness determined primarily by the frequency. At very high frequencies the diffusion layer is thin and follows the micro-profile of the surface so closely that the diffusion flux and the resulting deposit are even and no surface irregularity is amplified.