Carbon nitride thin films obtained by laser ablation of graphite in a nitrogen plasma
Carbon nitride thin films obtained by laser ablation of graphite in a nitrogen plasma
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DOI：
10.1016/0169-4332(95)00554-4
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发表时间：
1996-04
影响因子：
6.7
通讯作者：
M. C. Polo;R. Aguiar;P. Serra;L. Clèries;M. Varela;J. Esteve
中科院分区：
文献类型：
--
作者：
M. C. Polo;R. Aguiar;P. Serra;L. Clèries;M. Varela;J. Esteve
在氮气气氛中通过 KrF (248 nm) 激光烧蚀石墨沉积氮化碳薄膜。直流或射频氮等离子体也叠加到消融过程中。使用多种表征技术对薄膜进行了研究，例如扫描电子显微镜 (SEM)、二次离子质谱 (SIMS)、波长色散电子探针 X 射线微量分析 (WDS)、X 射线光电子能谱 (XPS)、傅里叶变换红外 (FT-IR) 和拉曼光谱。发现薄膜的氮浓度接近 10%。 XPS、FT-IR 和拉曼光谱显示，氮原子被取代地掺入薄膜中，形成共价 CN 键。还对烧蚀羽流进行了空间分辨光谱研究。
Carbon nitride thin films were deposited by KrF (248 nm) laser ablation of graphite in a nitrogen atmosphere. A dc or rf nitrogen plasma was also superimposed onto the ablation process. The films were studied using a wide range of characterization techniques such as scanning electron microscopy (SEM), secondary ion mass spectrometry (SIMS), wavelength-dispersive electron probe X-ray microanalysis (WDS), X-ray photoelectron spectroscopy (XPS), and Fourier transform infrared (FT-IR) and Raman spectroscopies. The films were found to have a nitrogen concentration close to 10%. Nitrogen atoms were incorporated substitutionally in the films forming covalent CN bonds as revealed by XPS, FT-IR and Raman spectroscopies. Spatially resolved optical spectroscopy studies of the ablation plume were also carried out.