Achieving λ/20 Resolution by One-Color Initiation and Deactivation of Polymerization
Achieving λ/20 Resolution by One-Color Initiation and Deactivation of Polymerization
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DOI：
10.1126/science.1168996
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发表时间：
2009-05-15
期刊：
影响因子：
56.9
通讯作者：
Fourkas, John T.
中科院分区：
文献类型：
--
作者：
Li, Linjie;Gattass, Rafael R.;Fourkas, John T.
在传统的光刻中，衍射将分辨率限制在所用光波长的四分之一左右。我们介绍了一种方法，其中多光子吸收的脉冲800纳米（nm）的光是用来引发交联的聚合物光致抗蚀剂和单光子吸收的连续波800 nm的光是同时使用的光聚合失活的光刻。通过采用空间相位成形的失活光束，我们证明了制造的功能可扩展的分辨率沿着的光束轴，下降到40 nm的最小特征尺寸。我们预计这种技术的应用，用于制造不同的二维和三维结构的特征尺寸是一小部分的波长的光。
In conventional photolithography, diffraction limits the resolution to about one-quarter of the wavelength of the light used. We introduce an approach to photolithography in which multiphoton absorption of pulsed 800-nanometer (nm) light is used to initiate cross-linking in a polymer photoresist and one-photon absorption of continuous-wave 800-nm light is used simultaneously to deactivate the photopolymerization. By employing spatial phase-shaping of the deactivation beam, we demonstrate the fabrication of features with scalable resolution along the beam axis, down to a 40-nm minimum feature size. We anticipate application of this technique for the fabrication of diverse two- and three-dimensional structures with a feature size that is a small fraction of the wavelength of the light employed.