Magnetocrystalline and Uniaxial Anisotropy in Electrodeposited Single Crystal Films of Cobalt and Nickel
Magnetocrystalline and Uniaxial Anisotropy in Electrodeposited Single Crystal Films of Cobalt and Nickel
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钴和镍电沉积单晶薄膜中的磁晶和单轴各向异性
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发表时间：
1968
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通讯作者：
J. Goddard
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作者：
J. Goddard
用扭矩磁强计测定了FCC单晶的磁晶各向异性(K1和K2)以外的单轴各向异性Ku。在(110)Cu单晶衬底上电沉积Co和Ni薄膜。结果表明，Ku的易解方向为薄膜平面上的[0 0 1]，在10 0 0A处，Ku的大小为K1量级，在15 0A附近，Co的最大值为-7.7×10 5erg cm-3，Ni的最大值为-3.4×10 5erg cm-3，厚度K1和K2也达到极大值.给出了以埃为单位描述厚度对t的依赖关系的经验关系式：Begin{Align}-K_{u}(\Text{erg}\\text{cm}^{-3}){=}K_{0}\exp(-t/n)+K_{\infty}[1-\exp(-t/100)]\End{Align}这两个项分别表示源于初始层的应变能和包含在沉积层中的氢的贡献。给出了复合层薄膜的K1、K2和Ku的测量结果。
Torque magnetometry was used to determine the uniaxial anisotropy, K u , observed in addition to the normal magnetocrystalline anisotropy ( K 1 and K 2 ) in single crystal f.c.c. Co and Ni films electrodeposited on to (110) Cu single crystal substrates. The easy direction of K u was found to be the [001] in the film plane and its magnitude at 1000A was of the order of K 1 for each material with maximum values of -7.7×10 5 erg cm -3 for Co and -3.4×10 5 erg cm -3 for Ni occurring at about 150A at which thickness K 1 and K 2 also attained maxima. An empirical relation describing the dependence upon thickness t in angstroms is given of the form, \begin{aligned} -K_{u}(\text{erg}\ \text{cm}^{-3}){=}K_{0}\exp(-t/n)+K_{\infty}[1-\exp(-t/100)] \end{aligned} The two terms represent the contributions from strain energy originating in the initial layers and in hydrogen included into the deposit respectively. Measurements of K 1 , K 2 and K u are given for composite layer films which yield unexpected results.