High frequency characteristics of FeCoAlO thin films combined the effects of stress and magnetic field

High frequency characteristics of FeCoAlO thin films combined the effects of stress and magnetic field
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DOI:
10.1063/1.3551593
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发表时间:
2011-03
影响因子:
3.2
通讯作者:
F. Zheng;Xuan Wang;Xu Li;J. Bai;D. Wei;Xiaoxi Liu;W. Xie;F. Wei
F. Zheng;Xuan Wang;Xu Li;J. Bai;D. Wei;Xiaoxi Liu;W. Xie;F. Wei
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
F. Zheng;Xuan Wang;Xu Li;J. Bai;D. Wei;Xiaoxi Liu;W. Xie;F. Wei

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采用射频磁控溅射技术制备了不同高频响应的软磁FeCoAlO薄膜。使用了两种不同配置的溅射靶材:将Al_2O_3芯片放置在Fe70Co30圆盘上,或者均匀地分散在溅射区域(Target-A)上或分散在溅射区域的半侧(Target-B)上。研究发现,虽然靶材A和靶材B都具有良好的软磁性能和面内单轴磁各向异性,但在高频下表现出不同的行为。使用Target-A沉积的薄膜的平均磁导率为500,截止频率fr约为780 MHz,而使用Target-B沉积的薄膜的平均磁导率为200,fr为3.4 GHz。后者的高fr对应于用Target-B沉积的薄膜中较高的单轴各向异性场,这是由于Al-O组分的梯度引起的应力引起的额外的各向异性。通过广告..。
The soft magnetic FeCoAlO thin films with different response at high frequency were prepared by using RF magnetron sputtering. Two different configurations of the sputtering targets were used: the Al2O3 chips were placed on Fe70Co30 disk either uniformly dispersed on the sputtering area (Target-A) or dispersed on the half side of the sputtering area (Target-B). It was found that, although, the films deposited from both of Target A and B possessed good soft magnetic properties and in-plane uniaxial magnetic anisotropy, they showed different behaviors at high frequency. The films deposited by using Target-A have mean permeability of 500 and a cut-off frequency (fr) of around 780 MHz, while the films deposited by using Target-B have mean permeability of 200 and a fr of 3.4 GHz. The higher fr of the later corresponds to the higher uniaxial anisotropic field in the films deposited by using the Target-B, which due to an extra anisotropy induced by the stress resulted from gradient of the Al-O composition. By ad...