Chemical solution deposition:: a path towards low cost coated conductors
Chemical solution deposition:: a path towards low cost coated conductors
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DOI：
10.1088/0953-2048/17/8/020
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发表时间：
2004-08-01
影响因子：
3.6
通讯作者：
van Tendeloo, G
中科院分区：
文献类型：
--
作者：
Obradors, X;Puig, T;van Tendeloo, G
实现高临界电流YBa2Cu3O7涂层导体的低成本沉积技术是实现超导在电力应用中广泛应用的主要目标之一。化学溶液沉积技术是一种非常有前途的低成本制备外延氧化薄膜的方法，因此人们正在努力开发适用于所有化学涂层导体带的方法。在这项工作中，最近的成就将介绍基于金属有机分解的不同类型缓冲层在金属基底上的沉积与使用三氟乙酸途径生长YBa2Cu3O7层的目标。重点讨论了工艺参数对合金微观结构和超导性能的影响。在“全化学”多层材料中证明了高临界电流。
The achievement of low cost deposition techniques for high critical current YBa2Cu3O7 coated conductors is one of the major objectives to achieve a widespread use of superconductivity in power applications. Chemical solution deposition techniques are appearing as a very promising methodology to achieve epitaxial oxide thin films at a low cost, so an intense effort is being carried out to develop routes for all chemical coated conductor tapes. In this work recent achievements will be presented towards the goal of combining the deposition of different type of buffer layers on metallic substrates based on metal-organic decomposition with the growth of YBa2Cu3O7 layers using the trifluoroacetate route. The influence of processing parameters on the microstructure and superconducting properties will be stressed. High critical currents are demonstrated in 'all chemical' multilayers.