XPS and AFM characterization of aminosilanes with different numbers of bonding sites on a silicon wafer
XPS and AFM characterization of aminosilanes with different numbers of bonding sites on a silicon wafer
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DOI：
10.1002/sia.5311
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发表时间：
2013-11-01
影响因子：
1.7
通讯作者：
Kovac, J.
中科院分区：
文献类型：
--
作者：
Jaksa, G.;Stefane, B.;Kovac, J.
这项工作的目的是制备和表征的硅表面改性的不同的自组装氨基丙基硅烷的目的是使用它们在传感器应用。用具有不同键合位点数目的氨基硅烷改性单晶硅晶片（111）：3-氨基丙基三甲氧基硅烷（APTMS）、3-氨基丙基二乙氧基甲基硅烷（APRDMS）和3-氨基丙基乙氧基二甲基硅烷（APREMS）。我们沉积的自组装层的氨基硅烷在甲苯中的溶液在各种反应条件下。使用X射线光电子能谱法测定表面组成和化学键合。此外，表面形貌进行了研究，使用原子力显微镜。我们的研究结果表明，与硅氧化物层和氨基硅烷的聚合反应取决于可能的键合位点的数量。APTMS与Si氧化物层反应最强烈;观察到APRDMS的反应不太强烈;观察到APREMS的反应最不强烈。版权所有（c）2013约翰威利父子有限公司
The aim of this work was the preparation and characterization of a silicon surface modified by different self-assembled aminopropylsilanes with the purpose of using them in sensor applications. Single-crystal silicon wafers (111) were modified with aminosilanes that have different numbers of bonding sites: 3-aminopropyltrimethoxysilane (APTMS), 3-aminopropyldiethoxymethylsilane (APRDMS) and 3-aminopropylethoxydimethylsilane (APREMS). We deposited the self-assembled layers from a solution of aminosilanes in toluene under various reaction conditions. The surface composition and the chemical bonding were determined using X-ray photoelectron spectroscopy. Furthermore, the surface morphology was investigated using atomic force microscopy. Our results show that the reactivity with the Si-oxide layer and the polymerization of aminosilanes depend on the number of possible bonding sites. The APTMS reacted the most intensively with the Si-oxide layer; a less intensive reaction was observed for the APRDMS; and the least intensive reaction was observed for the APREMS. Copyright (c) 2013 John Wiley & Sons, Ltd.