Observation of initial deposition process of electroless nickel plating by quartz crystal microbalance method and microscopy
Observation of initial deposition process of electroless nickel plating by quartz crystal microbalance method and microscopy
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石英晶体微天平法和显微镜观察化学镀镍的初始沉积过程
DOI：
10.1016/s0013-4686(02)00322-5
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发表时间：
2002
期刊：
影响因子：
--
通讯作者：
Y. Inoue
中科院分区：
文献类型：
--
作者：
H. Matsubara;Takehide Yonekawa;Y. Ishino;H. Nishiyama;N. Saito;Y. Inoue
采用石英晶体微天平法（QCM）和显微镜相结合的方法研究了化学镀镍的初始沉积过程。研究发现，沉积初期沉积速率异常，沉积开始前的诱导期、沉积速率增大的加速期、沉积速率减小的减速期和沉积速率恒定的稳定期为4个阶段。沉积物的实际表面积增加，直到沉积物连续并达到恒定值。另一方面，随着沉积的进行，单位实际表面积的沉积速率单调下降。结果，观察到异常的初始沉积速率。当催化过程重复4次时，沉积中也出现了四个周期。在这种情况下，初始阶段的晶粒数量更多，并且形核仍在继续，直到沉积物连续。因此，最初的沉积物在较低的厚度上是连续的。
The initial deposition process of electroless nickel plating was investigated by combining a quartz crystal microbalance (QCM) method with microscopy. The authors found an anomalous deposition rate in the initial deposition and four stages were noted: an induction period before the initiation of deposition, an acceleration period with an increase in the deposition rate, a deceleration period with a decrease in the deposition rate and a stationary period at a constant deposition rate. The practical surface area of the deposits increased until the deposits became continuous and reached a constant value. On the other hand, the deposition rate per unit practical surface area decreased monotonously as the deposition proceeded. As a result, an anomalous initial deposition rate was observed. The four periods also appeared in the deposition when the catalyzation process was repeated 4 times. In this case, the number of grains at the initial stage was greater, and nucleation still continued until the deposits became continuous. The initial deposits, therefore, became continuous at lower thickness.