Structural and magnetic properties of NiCuZn ferrite films deposited using sputtering
Structural and magnetic properties of NiCuZn ferrite films deposited using sputtering
复制标题
DOI：
10.1007/s10854-022-09803-4
复制
发表时间：
2023-02
期刊：
影响因子：
--
通讯作者：
R. Paul;S. Kotru;J. A. Abu Qahouq
中科院分区：
文献类型：
--
作者：
R. Paul;S. Kotru;J. A. Abu Qahouq
铁氧体薄膜是一种很有前途的功率电感材料。在这项工作中，我们研究了Ni0. 35Cu0. 2Zn0. 45Fe2O4薄膜的结构和磁性能，以了解退火温度，晶粒尺寸，微晶尺寸，晶格常数，微应变，位错密度和磁性能之间的相关性。采用溅射法在室温下在Si衬底上制备了薄膜。薄膜在沉积后退火以调整微结构。通过X射线衍射（XRD）分析证实了薄膜的结晶性和尖晶石结构。扫描电子显微镜显示，薄膜是无裂纹的，并观察到的晶粒尺寸的线性增长与退火温度的增加。从XRD数据计算的微晶尺寸，晶格常数，微应变，和位错密度表明，晶格缺陷减少时，薄膜在较高的温度下退火，导致饱和磁化强度的值增加。在800 ° C下退火的薄膜最大饱和磁化强度为387 emu/cc，无裂纹。
Ferrite films are promising materials for power inductor applications. In this work, we investigated the structural and magnetic properties of Ni0.35Cu0.2Zn0.45Fe2O4films to understand the correlation between annealing temperature, grain size, crystallite size, lattice constant, microstrain, dislocation density, and magnetic properties. The films were deposited at room temperature on Si substrates using sputtering method. Films were annealed post-deposition to tune the microstructure. The crystallinity and spinel structure of the films were confirmed by x-ray diffraction (XRD) analysis. Scanning electron microscopy revealed that films were crack-free, and a linear growth in the grain size with an increase in annealing temperature was observed. The crystallite size, lattice constant, microstrain, and dislocation density calculated from the XRD data indicate that the lattice imperfection decreased when films were annealed at higher temperatures, resulting in an increase in the value of saturation magnetization. Crack-free films with maximum saturation magnetization of 387 emu/cc were obtained from the film annealed at 800 °C.