Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device
Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device
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DOI：
10.1016/j.jnucmat.2014.11.131
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发表时间：
2015-08
影响因子：
3.1
通讯作者：
H. Takahashi;M. Osakabe;K. Nagaoka;H. Nakano;M. Tokitani;K. Fujii;S. Murakami;Y. Takeiri;T. Seki;K. Saito;H. Kasahara;R. Seki;S. Kamio;S. Masuzaki;T. Mutoh
中科院分区：
文献类型：
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作者：
H. Takahashi;M. Osakabe;K. Nagaoka;H. Nakano;M. Tokitani;K. Fujii;S. Murakami;Y. Takeiri;T. Seki;K. Saito;H. Kasahara;R. Seki;S. Kamio;S. Masuzaki;T. Mutoh
使用射频（RF）等离子体的壁调节是使用离子回旋加速器频率范围（ICRF）加热和/或电子回旋加速器共振加热（ECRH）以及氦工作气体在建立的约束磁场下进行的。经过足够次数的重复壁放电调节（ICRF 的 DC、ICDC 和 ECRH 的 ECDC）后，观察到抛物线电子密度分布的形成和中心离子温度 Ti 的增加。无论所施加的射频源如何，在使用相似的输入能量值进行调节后，NBI 放电所达到的中心 Ti 没有差异。因此，得出的结论是，ICDC 和 ECDC 对于大型螺旋装置中已建立的磁场下的更高Ti等离子体产量都是有效的。还研究了高Tiplasma 生产的有效射频墙调节方案。
The wall conditioning using radio frequency (RF) plasma was carried out using Ion Cyclotron Range of Frequency (ICRF) heating and/or Electron Cyclotron Resonance Heating (ECRH) with the working gas of helium under the established confinement magnetic field. After sufficient numbers of repetitive wall discharge conditioning (DC, ICDC for ICRF and ECDC for ECRH), the formation of the parabolic electron density profile and the increase of the central ion temperatureTiwere observed. There was no difference in the attained centralTiof the NBI discharge just after the conditioning using a similar value of input energy regardless of the applied RF source. Thus, it is concluded that both ICDC and the ECDC are effective for the higherTiplasma production under the established magnetic field in the Large Helical Device. The effective RF wall conditioning scenarios are also investigated for highTiplasma production.