Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructures using LIGA process
Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructures using LIGA process
复制标题
使用 LIGA 工艺压花 PZT 生产高纵横比微结构的 PMMA 和 SU-8 抗蚀剂模具的比较
DOI：
10.1007/s00542-001-0141-y
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发表时间：
2002
期刊：
影响因子：
--
通讯作者：
R. Lawes
中科院分区：
文献类型：
--
作者：
A. Schneider;B. Su;T. Button;L. Singleton;O. Wilhelmi;S. Huq;P. Prewett;R. Lawes
摘要本文通过一系列实验，探讨了将陶瓷材料PZT（钛酸铅锆）插入不同类型高纵横比抗蚀剂模具的可行性。聚甲基丙烯酸甲酯（PMMA）和硅基板上的SU-8和带有微腔或通孔（由x射线光刻定义）的独立SU-8膜已被用作成型介质。比较了抗蚀剂材料的预焙、曝光、后焙、显影和剥离等工艺条件。对LIGA工艺中不同类型的抗蚀模具的优点进行了评价。此外，还对PMMA和SU-8的光敏性进行了比较。使用一系列负载压力（5至60 MPa），确定了PZT压印到抗蚀剂模具中的适当条件（确保最终PZT结构中最小的空隙形成）。在最终形式中，SU-8模具已被激光烧蚀去除。这是首次报道使用SU-8模具和PZT压花组合制造的高纵横比陶瓷微结构。
Abstract In this paper results are presented from a range of experiments to explore the feasibility of inserting a ceramic material PZT (lead zirconium titanate) into different kinds of high-aspect-ratio resist moulds. Polymethylmethacrylate (PMMA) and SU-8 on silicon substrates and free-standing SU-8 membranes with micro-cavities or through-holes (defined by X-ray lithography) have been used as moulding medium. Processing conditions for the resist materials including pre-bake, exposure, post-bake, development and stripping have been compared. The advantages of different types of resist mould for the LIGA process has been evaluated. Additionally a comparison of photosensitivity of PMMA and SU-8 has been carried out. Using a range of load pressures (5 to 60 MPa), appropriate conditions for PZT embossing into resist moulds have been determined (ensuring minimum void formation in the final PZT structures). In the final form, SU-8 moulds have been removed by laser ablation. This is the first reporting of high-aspect-ratio ceramic microstructures fabricated using a combination of SU-8 moulds and PZT embossing.