RF stabilization of high-density plasma in an axisymmetric mirror II: empirical scaling

RF stabilization of high-density plasma in an axisymmetric mirror II: empirical scaling
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轴对称镜中高密度等离子体的射频稳定性 II:经验缩放

DOI:
10.1088/0029-5515/25/1/003
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发表时间:
1985
期刊:
影响因子:
--
通讯作者:
R. Itatani
R. Itatani
中科院分区:
--
文献类型:
--
作者:
Y. Yasaka;R. Itatani

文献摘要

被引文献

相似文献

本文研究了不同等离子体参数下轴对称反射镜中槽不稳定性的射频稳定化。获得了稳定所需的RF场强的经验定标公式。根据定标公式,预测了聚变定向等离子体稳定的合理射频电场强度值为1.1 kV·cm−1。
RF stabilization of flute instabilities in an axisymmetric mirror is investigated for yarious plasma parameters. An empirical scaling formula for the RF field strength necessary for stabilization is obtained. From the scaling formula, the reasonable RF electric field strength value of 1.1 kV·cm−1 is predicted for stabilization of a fusion-oriented plasma.