CVD diamond coating on WC–Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment
CVD diamond coating on WC–Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment
复制标题
使用 ECR MPCVD 设备通过电泳晶种预处理在 WC-Co 切削刀具上进行 CVD 金刚石涂层
DOI：
10.1016/s0257-8972(03)00033-1
复制
发表时间：
2003
影响因子：
5.4
通讯作者：
Nobumitsu Yatsushiro
中科院分区：
文献类型：
--
作者：
Toshiki Tsubota;S. Ida;Naoki Okada;M. Nagata;Y. Matsumoto;Nobumitsu Yatsushiro
Electrophoresis was utilized as a seeding process for CVD diamond synthesis. The number of diamond particles deposited depended on the electrophoretic conditions. After the electrophoretic deposition process, CVD diamond film was synthesized on WC–Co substrate using ECR microwave plasma CVD apparatus. The density of nuclei after the CVD process was insufficient for the formation of diamond film in the case of no Co removal by acid, when a scratching pretreatment was adopted. On the other hand, electrophoretic deposition was effective for the formation of film-type deposits.
