Femtosecond Two-Photon 3D Lightfield Lithography
Femtosecond Two-Photon 3D Lightfield Lithography
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飞秒双光子 3D 光场光刻
DOI：
10.1115/ht2021-62290
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发表时间：
2021
期刊：
影响因子：
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通讯作者：
Aravind Jakkinapalli, Balaji Baskar
中科院分区：
文献类型：
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作者：
Aravind Jakkinapalli, Balaji Baskar
基于我们去年成功的单光子三维光场光刻，我们将该方法扩展到飞秒三维光场光刻。与我们以前使用UV LED光的单光子工作相比，在3D光场光刻中使用飞秒光和相关的双光子光吸收可以仅在3D空间中的设计体素位置周围固化光刻胶。这种双光子方案可以防止光致抗蚀剂在到达设计的体素位置之前沿着光线的光路沿着不希望的固化，这在我们先前的基于UV LED的单光子3D光场光刻中观察到。飞秒双光子三维光场光刻的实验方案是将均匀的飞秒激光脉冲传输到空间光调制器中。设计的像素图呈现在空间光调制器上，然后传递到微透镜阵列，以在自由空间中构建3D虚拟图像。通过利用显微镜系统压缩光刻胶层中的3D虚像，我们可以成功地生成不同的微尺度3D图案，而不依赖于传统3D光刻中的扫描过程。在这项研究中，我们提出了初步的结果（a）算法开发，以产生三维图案的飞秒光，这应该满足额外的限制，当使用飞秒光，和（B）三维图案产生的光致抗蚀剂与飞秒双光子三维光场光刻。
Based on the successful single-photon 3D light field photolithography we demonstrated in the last year, we extend the methodology to femtosecond 3D light field lithography. Compared with our previous single-photon work with UV LED light, using femtosecond light and the associated two-photon light absorption in 3D light field lithography can cure photoresist only around designed voxel locations in a 3D space. Such a two-photon scheme can prevent the unwilling curing of photoresists along the optical paths of rays before arriving at designed voxel locations, which is observed in our previous UV LED-based single-photon 3D light field lithography. The experimental scheme of femtosecond two-photon 3D light field lithography starts from delivering uniform femtosecond laser pulses to a spatial light modulator. The designed pixel map is presented on the spatial light modulator and then delivered to a microlens array to construct a 3D virtual image in the free space. By compressing the 3D virtual image in a photoresist layer with a microscope system, we can successfully generate different microscale 3D patterns without relying on scanning processes as in traditional 3D lithography. In this study, we present preliminary results of (a) algorithms developed to generated 3D patterns with femtosecond light, which should satisfy additional constraints when femtosecond light is used, and (b) 3D patterns generated in photoresists with femtosecond two-photon 3D light field lithography.