Nanohole processing on silicon substrate by femtosecond laser pulse with localized surface plasmon polariton
Nanohole processing on silicon substrate by femtosecond laser pulse with localized surface plasmon polariton
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DOI：
10.1016/j.apsusc.2007.02.108
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发表时间：
2007-07-31
影响因子：
6.7
通讯作者：
Obara, Minoru
中科院分区：
文献类型：
--
作者：
Atanasov, Petar A.;Takada, Hiroto;Obara, Minoru
我们展示了金纳米粒子介导的飞秒激光脉冲照射在硅表面上的纳米孔的制造。通过旋涂法将直径为40、80或200 nm的金球放置在硅衬底表面上。使用持续时间为150 fs和2个波长为820 nm的激光脉冲照射Si衬底。所施加的激光能量密度在140 - 300 mJ/cm（2）的范围内，即低于或接近没有金颗粒的体硅衬底的烧蚀阈值能量密度。用扫描电子显微镜（SEM）和原子力显微镜（AFM）研究了激光辐照区的形貌变化。研究了它们与颗粒直径、形状和激光能量密度的关系。烧蚀的表面形貌被发现强烈依赖于偏振和激光脉冲的能量。在200 nm直径的颗粒的情况下，在没有Au颗粒的情况下，在低于Si的阈值的注量下产生直径为约150 nm且深度在30 nm范围内的纳米孔。在一定的激光能量密度下，孔的直径和深度随颗粒尺寸的增大而增大。利用FDTD模拟程序计算了Si表面的光场增强因子。对于200 nm的Au颗粒，获得约26的最大值。实现的电磁场增强因子的理论结果和实验结果之间的比较，以解释的纳米加工过程的物理。(c)2007 Elsevier B.V.保留所有权利。
We demonstrate nanohole fabrication on silicon surface by femtosecond laser pulse irradiation mediated by gold nanoparticles. Gold spheres with diameters of 40, 80 or 200 nm are placed on the silicon substrate surface by a spin-coating method. The laser pulse with duration of 150 fs and 2 wavelength of 820 nm is used to irradiate the Si substrate. Laser fluences applied are in the range of 140-300 mJ/cm(2), i.e. below or near the ablation threshold fluence of the bulk silicon substrate without gold particles. The morphological changes of the laser-irradiated areas are investigatedby scanning electron microscope (SEM) and atomic force microscope (AFM). Their dependence on the particle diameter, shape and laser fluence is investigated. The ablated surface morphologies are found to strongly depend on the polarization and the energy of the laser pulse. Nanoholes with diameters of about 150 nm and depths in the range of 30 nm are produced in the case of 200 nm diameter particles at fluences below the threshold for Si without Au particles. At fixed laser fluence the diameter and depth of the holes increase with the particle sizes. The optical field enhancement factor on the Si surface is calculated using an FDTD simulation code. A maximal value of about 26 is obtained for 200 nm Au particles. The comparison between the theoretical results for the electromagnetic field enhancement factor achieved and the experimental results is made in order to explain the physics of the nanomachining process. (c) 2007 Elsevier B.V. All rights reserved.