Electrochemical Erasing Using a Polymer Lithography Editor for the Fabrication of Photoactive Devices
Electrochemical Erasing Using a Polymer Lithography Editor for the Fabrication of Photoactive Devices
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DOI:
10.1021/acsaelm.9b00099
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发表时间:
2019-04
影响因子:
4.7
通讯作者:
Nathalie Becerra-Mora;Annie Y. Vargas-Lizarazo;C. Orrison;M. Barron;R. Balaraman;P. Kohli
中科院分区:
文献类型:
--
作者:
Nathalie Becerra-Mora;Annie Y. Vargas-Lizarazo;C. Orrison;M. Barron;R. Balaraman;P. Kohli
Electrochemical erasing of conductive coatings at microscale for the fabrication of functional devices on flexible and hard surfaces is demonstrated. The nanoporous pyramidal-shaped nano- and microscale polyacrylamide hydrogel PLE probes allowed delivery of electrochemical etchants to the surface, providing on-demand maskless patterning at microscale. Highly efficient erasing (silver and copper metals erasing efficiency ≈ 100%), areal erasing rate ≈ 80 μm2/s, and pressure dependent spatial erasing feature dimensions between 3 μm to many tens of microns on metal surfaces allowed for the fabrication of microelectrodes of various geometries. Overall, PLE-based microscale erasing allowed for rapid and accessible fabrication of organic electron–hole carrier pair-based microphotodetector, as well as the assembly of LED on flexible and rigid ITO substrates.