Electrochemical Erasing Using a Polymer Lithography Editor for the Fabrication of Photoactive Devices

Electrochemical Erasing Using a Polymer Lithography Editor for the Fabrication of Photoactive Devices
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DOI:
10.1021/acsaelm.9b00099
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发表时间:
2019-04
影响因子:
4.7
通讯作者:
Nathalie Becerra-Mora;Annie Y. Vargas-Lizarazo;C. Orrison;M. Barron;R. Balaraman;P. Kohli
Nathalie Becerra-Mora;Annie Y. Vargas-Lizarazo;C. Orrison;M. Barron;R. Balaraman;P. Kohli
中科院分区:
材料科学3区
文献类型:
--
作者:
Nathalie Becerra-Mora;Annie Y. Vargas-Lizarazo;C. Orrison;M. Barron;R. Balaraman;P. Kohli

文献摘要

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电化学擦除导电涂层在微尺度上的柔性和硬表面上的功能器件的制造被证明。纳米多孔杯形纳米和微米级聚丙烯酰胺水凝胶PLE探针允许将电化学蚀刻剂递送到表面,从而提供微米级的按需无掩模图案化。高效擦除(银和铜金属擦除效率> 100%)、面积擦除速率> 80 μm2/s以及金属表面上的3 μm到数十微米之间的压力相关空间擦除特征尺寸允许制造各种几何形状的微电极。总的来说,基于PLE的微尺度擦除允许快速且可访问的基于有机电子-空穴载流子对的微光电探测器的制造,以及在柔性和刚性ITO基板上的LED的组装。
Electrochemical erasing of conductive coatings at microscale for the fabrication of functional devices on flexible and hard surfaces is demonstrated. The nanoporous pyramidal-shaped nano- and microscale polyacrylamide hydrogel PLE probes allowed delivery of electrochemical etchants to the surface, providing on-demand maskless patterning at microscale. Highly efficient erasing (silver and copper metals erasing efficiency ≈ 100%), areal erasing rate ≈ 80 μm2/s, and pressure dependent spatial erasing feature dimensions between 3 μm to many tens of microns on metal surfaces allowed for the fabrication of microelectrodes of various geometries. Overall, PLE-based microscale erasing allowed for rapid and accessible fabrication of organic electron–hole carrier pair-based microphotodetector, as well as the assembly of LED on flexible and rigid ITO substrates.