Deposition of TiN coatings on shape memory NiTi alloy by plasma immersion ion implantation and deposition
Deposition of TiN coatings on shape memory NiTi alloy by plasma immersion ion implantation and deposition
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DOI：
10.1016/j.tsf.2006.03.041
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发表时间：
2006-12-05
期刊：
影响因子：
2.1
通讯作者：
Zheng, Y. F.
中科院分区：
文献类型：
--
作者：
Cheng, Y.;Zheng, Y. F.
研究了脉冲负偏压对等离子浸没离子注入沉积TiN涂层的形貌、微观结构、力学性能、结合力和摩擦学性能的影响。在15W和20W负偏压下沉积的样品表面比较光滑和均匀，均方根值较小。X射线衍射结果表明，脉冲负偏压可以显著改变TiN涂层的微观结构。在5~20W的负偏压范围内，TiN(220)峰的强度随负偏压的增大而增大，当负偏压增加到30W时，TiN(200)晶面择优取向。纳米压痕试验表明，随着负偏压(5W、15W和20W)的增加，TiN的硬度和弹性模量增加，30W时硬度和弹性模量急剧下降。TiN与NiTi合金的结合力和TiN涂层NiTi合金的摩擦学性能强烈依赖于偏压参数，在20W沉积的样品具有良好的结合力和优异的摩擦学性能。(C)2006爱思唯尔B.V.保留所有权利。
An investigation has been carried out to study the effect of pulse negative bias voltage on the morphology, microstructure, mechanical, adhesive and tribological properties of TiN coatings deposited on NiTi substrate by plasma immersion ion implantation and deposition. The surface morphologies were relatively smooth and uniform with lower root mean square values for the samples deposited at 15 W and 20 W negative bias voltages. X-ray diffraction results demonstrated that the pulse negative bias voltage can significantly change the microstructure of TiN coatings. The intensity of TiN(220) peak increased with the increase of negative bias voltage in the range of 5-20 W. When the negative bias voltage increased to 30 W, the preferred orientation was TiN(200). Nanoindentation test indicates that hardness and elastic modulus increased with the increase of the negative bias voltage (5 W, 15 W and 20 W), and then dropped sharply at 30 W The adhesion between the TiN and NiTi alloy and tribological properties of TiN coated NiTi alloy depend strongly on the bias voltage parameter; the sample deposited at 20 W possesses good adhesion strength and excellent tribological property. (c) 2006 Elsevier B.V. All rights reserved.