Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified ExtremeUltraviolet Resists

Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified ExtremeUltraviolet Resists
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化学放大极紫外光刻胶中产生的接触孔潜像的化学梯度

DOI:
10.7567/jjap.52.046502
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发表时间:
2013
期刊:
Jpn. J. Appl. Phys
影响因子:
--
通讯作者:
T. Kozawa and T. Hirayama
T. Kozawa and T. Hirayama
中科院分区:
--
文献类型:
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作者:
Takeshi Fujiwara;Mitsuru Uesaka;他;T. Kozawa and T. Hirayama

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