Electron energy dependence of vacuum ultraviolet emission and H− production in a low-pressure hydrogen plasma
Electron energy dependence of vacuum ultraviolet emission and H− production in a low-pressure hydrogen plasma
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低压氢等离子体中真空紫外发射和 H− 产生的电子能量依赖性
DOI：
10.1063/1.1148621
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发表时间：
1998
影响因子：
1.6
通讯作者：
Eiji Niitani
中科院分区：
文献类型：
--
作者：
O. Fukumasa;Norihisa Mizuki;Eiji Niitani
讨论了通过振动激发基态分子H2（v″小于或等于5）产生纯H -体积的两步过程。这种振动激发的主要来源是通过快速初级电子的单线态激发，然后是真空紫外线（VUV）发射。来自低压氢等离子体的VUV发射已被用于研究H2（v″小于或等于5）分子的产生机制及其电子能量依赖性，在双等离子体源中，其中快速电子的能量和密度都得到很好的控制。在123和124.9 nm波长处，快电子能量和密度对VUV发射强度影响较大。单重态激发的快电子能量存在一定的阈值，其次是H2（v″）激发。能量超过15-20 eV的快电子主要对VUV发射强度有贡献，并足以增加H−的产生。
A two-step process of pure H− volume production via vibrationally excited ground state molecules H2(v″⩾5) is discussed. The principal source of this vibrational excitation is through singlet excitation by fast primary electrons followed by vacuum ultraviolet (VUV) emission. The VUV emission from a low-pressure hydrogen plasma has been used to study the production mechanism of H2(v″⩾5) molecules and its electron energy dependence, in a double plasma source where both energy and density of fast electrons are well controlled. The fast electron energy and density strongly affect the VUV emission intensity at wave lengths of, for example, 123 and 124.9 nm. There exists a certain threshold in fast electron energy for singlet excitation and then for H2(v″) excitation. Fast electrons with energy in excess of 15–20 eV mainly contribute to the VUV emission intensity and are sufficient to increase H− production.